About: Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2

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About: Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2 Goto Sponge NotDistinct Permalink

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scientific article published on 01 November 2019

Attributes	Values
rdf:type	Item
description	wetenschappelijk artikel (nl) scientific article published on 01 November 2019 (en) artículu científicu espublizáu en payares de 2019 (ast) գիտական հոդված հրատարակված 2019 թվականի նոյեմբերի 1-ին (hy) наукова стаття, опублікована 1 листопада 2019 (uk)
publication date	wds:Q91515059-C6A6924F-6F53-44C1-B5CD-C472AF9434FB
publication date	2019-11-01 00:00:00Z (xsd:dateTime)
rdfs:label	Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2 (en) Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2 (nl)
skos:prefLabel	Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2 (en) Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2 (nl)
name	Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2 (en) Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2 (nl)
author	wds:Q91515059-495CE983-6CA4-4395-B040-8FB1055665CE wds:Q91515059-4DD6F5DE-F46C-458C-A7AF-A777C9E69303 wds:Q91515059-515D5724-8AB5-41D7-B410-EF3F93806F65 wds:Q91515059-5257AAB8-7974-4514-9020-888CA68BA008 wds:Q91515059-66E58DDF-EE02-4ED2-AF6C-FB2FBD19B75E wds:Q91515059-7F225692-F5AB-496F-BC77-4C0CF1C2302E wds:Q91515059-C26F0500-3F5B-486C-BAA4-D3EA084AD269 wds:Q91515059-FCBBFC1B-75B4-4628-9112-D6D4DF576ED2
author	Cheol Seong Hwang Maxim Kozodaev Evgeny Korostylev Andrey Markeev Yury Lebedinskii Anastasia Chouprik Anna Chernikova Roman Khakimov
title	wds:Q91515059-71480E3A-A36B-48A5-9A1E-EE108F736643
title	Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2 (en)
page(s)	wds:Q91515059-3720C84B-3AB5-4DF0-983D-3C577E94EA96
page(s)	204701
instance of	wds:Q91515059-413F68FE-2E76-49B1-AB71-961469153331
instance of	scholarly article
PubMed ID	wds:Q91515059-DE36585A-B8DA-4906-AD9B-0C8860A736D2
PubMed ID	http://rdf.ncbi.nlm.nih.gov/pubchem/reference/31779314
PubMed ID	31779314
published in	wds:Q91515059-9A28DA26-A526-4C39-8586-049C5735EAD8
published in	Journal of Chemical Physics
issue	wds:Q91515059-5D99563F-B764-4536-BBFB-A8D91B29243A
volume	wds:Q91515059-68A1DA07-FE75-4F62-A6D0-949109C86D3C
issue	20
volume	151
DOI	wds:Q91515059-C05F0D00-786E-4F08-B13F-C23AD7A3AA02
DOI	http://dx.doi.org/10.1063/1.5107509
DOI	10.1063/1.5107509
is about of	https://www.wikidata.org/wiki/Special:EntityData/Q91515059

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