About: Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films

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An Entity of Type : wikibase:Item, within Data Space : wikidata.demo.openlinksw.com associated with source document(s)

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rdf:type	Item
description	wetenschappelijk artikel (nl) article scientifique publié en 2009 (fr) наукова стаття, опублікована в січні 2009 (uk) im Januar 2009 veröffentlichter wissenschaftlicher Artikel (de)
publication date	wds:Q57641343-81E9BB1F-B83E-488F-BE9C-E2E5A13D86E4
publication date	2009-01-19 00:00:00Z (xsd:dateTime)
language of work or name	wds:Q57641343-6DD7E0E0-6503-4E23-9346-7D630160CCFB
language of work or name	English
cites work	wds:Q57641343-0A62A5CD-E706-4E1E-ACF7-BF7EB5B5BB2A wds:Q57641343-28D458B4-D64B-4E9C-AE6B-277892C4ADEE wds:Q57641343-34AD9B1D-F17D-4074-AD77-E4A12A6EF736 wds:Q57641343-56BF3379-381F-4B02-8FAA-397B24C7981A wds:Q57641343-63AA7005-322C-4AF0-945A-7566AE11318A wds:Q57641343-AA5E8D19-9C5C-4A4B-A5DD-1709729A8390
cites work	Towards implementation of a nickel silicide process for CMOS technologies Epitaxial Formation of a Metastable Hexagonal Nickel–Silicide Formation and morphological stability of NiSi in the presence of W, Ti, and Ta alloying elements Effects of additive elements on the phase formation and morphological stability of nickel monosilicide films An off-normal fibre-like texture in thin films on single-crystal substrates High-temperature degradation of NiSi films: Agglomeration versus NiSi2 nucleation
author name string	wds:Q57641343-084ED103-2C78-4A89-9A2E-058F7C5D8BB5 wds:Q57641343-0BA7A80E-06A2-4079-9EF1-4F841AC91B24 wds:Q57641343-6FF540EC-F682-4F43-A29C-F0D5C52D8EA7 wds:Q57641343-7AD65112-FC6D-48CD-9995-8160DE37108E wds:Q57641343-F432B440-B596-4689-96FA-CF3CE5187771 wds:Q57641343-FC4A197C-FB9D-4FAA-960D-ADF19C0F5671
author name string	C. Lavoie C. Detavernier C. Van Bockstael K. De Keyser R. L. Van Meirhaeghe J. L. Jordan-Sweet
rdfs:label	Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films (en) Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films (nl)
skos:prefLabel	Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films (en) Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films (nl)
name	Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films (en) Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films (nl)
title	wds:Q57641343-5F93BF96-9407-44D1-BF2B-0445DA4ED04D
title	Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films (en)
page(s)	wds:Q57641343-DFFDB2EC-8D6A-4F10-B472-5395082784E9
page(s)	033504
instance of	wds:Q57641343-997C5953-F7AE-4622-8E30-E5D7200ED719
instance of	scholarly article
main subject	wds:Q57641343-6F3DBD0F-8921-49CC-AC56-54452EB72F91
main subject	microstructure
published in	wds:Q57641343-FABFB5B9-F091-4A1D-8EEB-B23F7981EC82
published in	Applied Physics Letters
issue	wds:Q57641343-9F3164EC-8B76-4B53-BDF2-BF3F13DCAC1A
volume	wds:Q57641343-5B32560C-5C96-4CB1-ACB5-C51569704996
issue	3
volume	94
DOI	wds:Q57641343-4C0BC29B-1CB4-4D40-A7CE-8E233E704D95
DOI	http://dx.doi.org/10.1063/1.3073750
DOI	10.1063/1.3073750
is about of	https://www.wikidata.org/wiki/Special:EntityData/Q57641343
is cites work of	The thermally-induced reaction of thin Ni films with Si: Effect of the substrate orientation Texture in thin film silicides and germanides: A review In situ study of the formation of silicide phases in amorphous Ni–Si mixed layers
is cites work of	wds:Q57641262-BDDB79C8-C907-4BB0-80F0-5D285D0A259E wds:Q57641336-D2A405EE-087F-425C-AFD5-9A217033873D wds:Q57641162-8081895E-9C6F-4880-BDC4-997A9ABC1A7D

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