"380" . "wetenschappelijk artikel"@nl . . "Process stability and morphology optimization of very thick 4H\u2013SiC epitaxial layers grown by chloride-based CVD"@en . "P. Stenberg" . "55-60" . "2013-10-01T00:00:00Z"^^ . . . . "\u043D\u0430\u0443\u043A\u043E\u0432\u0430 \u0441\u0442\u0430\u0442\u0442\u044F, \u043E\u043F\u0443\u0431\u043B\u0456\u043A\u043E\u0432\u0430\u043D\u0430 \u0432 \u0436\u043E\u0432\u0442\u043D\u0456 2013"@uk . . . . . "Process stability and morphology optimization of very thick 4H\u2013SiC epitaxial layers grown by chloride-based CVD"@nl . "M. Yazdanfar" . "article scientifique publi\u00E9 en 2013"@fr . . . . . "Process stability and morphology optimization of very thick 4H\u2013SiC epitaxial layers grown by chloride-based CVD"@en . "Process stability and morphology optimization of very thick 4H\u2013SiC epitaxial layers grown by chloride-based CVD"@en . . . . . "I.D. Booker" . "Process stability and morphology optimization of very thick 4H\u2013SiC epitaxial layers grown by chloride-based CVD"@nl . . . . "10.1016/J.JCRYSGRO.2013.05.037" . . "Process stability and morphology optimization of very thick 4H\u2013SiC epitaxial layers grown by chloride-based CVD"@en . . . . "Process stability and morphology optimization of very thick 4H\u2013SiC epitaxial layers grown by chloride-based CVD"@nl . .