This HTML5 document contains 60 embedded RDF statements represented using HTML+Microdata notation.

The embedded RDF content will be recognized by any processor of HTML5 Microdata.

Namespace Prefixes

PrefixIRI
wdthttp://www.wikidata.org/prop/direct/
wdtnhttp://www.wikidata.org/prop/direct-normalized/
n11http://dx.doi.org/10.1103/
schemahttp://schema.org/
rdfshttp://www.w3.org/2000/01/rdf-schema#
skoshttp://www.w3.org/2004/02/skos/core#
wikibasehttp://wikiba.se/ontology#
phttp://www.wikidata.org/prop/
rdfhttp://www.w3.org/1999/02/22-rdf-syntax-ns#
n12http://rdf.ncbi.nlm.nih.gov/pubchem/reference/
xsdhhttp://www.w3.org/2001/XMLSchema#
wdshttp://www.wikidata.org/entity/statement/
wdhttp://www.wikidata.org/entity/

Statements

Subject Item
wd:Q74400069
rdf:type
wikibase:Item
schema:description
wetenschappelijk artikel im April 1994 veröffentlichter wissenschaftlicher Artikel наукова стаття, опублікована у квітні 1994 scientific article published on 01 April 1994 artículu científicu espublizáu n'abril de 1994
p:P577
wds:Q74400069-55CAA05A-E421-4F83-8996-53D9BEBDE2EF
wdt:P577
1994-04-01T00:00:00Z
p:P407
wds:Q74400069-68073C5B-0131-4DB8-9027-117F06C3D675
wdt:P407
wd:Q1860
p:P2860
wds:Q74400069-A390F961-52A6-4C61-B346-B32F3C681D92 wds:Q74400069-011CAAE5-7E1D-433A-A087-B9C72F6391E4 wds:Q74400069-0B5435B8-979E-4D98-9BCA-5E346609F0BA wds:Q74400069-182D85B9-7644-49E6-8C79-378F39D4DB46 wds:Q74400069-15C36174-6789-4926-AE9F-DAD8D7A2CABA wds:Q74400069-BF31547C-89AF-4661-A872-E8BE913D150E wds:Q74400069-FFF36B68-A5E8-4A3D-8C7C-86B92C7FC91E wds:Q74400069-E64E525F-CCB5-4596-B0A5-407DB09D71E6 wds:Q74400069-538D7D3E-C66E-4EEC-88B5-24FD2F00B407
wdt:P2860
wd:Q62022243 wd:Q77999247 wd:Q78183708 wd:Q74482081 wd:Q62022217 wd:Q78005064 wd:Q77981091 wd:Q78202712 wd:Q78014870
p:P2093
wds:Q74400069-AE279F85-954A-4554-B54B-A889D93DE33F wds:Q74400069-90566B3E-67ED-4C54-A2DD-133A217752FE wds:Q74400069-5652B864-D5D6-4CFB-BE4C-A4AAE717EDCE
wdt:P2093
Yoon JH Park HR Lee YZ
rdfs:label
Thermal relaxation of the deposition-induced nonequilibrium state and steady-state defect density in hydrogenated amorphous silicon Thermal relaxation of the deposition-induced nonequilibrium state and steady-state defect density in hydrogenated amorphous silicon
skos:prefLabel
Thermal relaxation of the deposition-induced nonequilibrium state and steady-state defect density in hydrogenated amorphous silicon Thermal relaxation of the deposition-induced nonequilibrium state and steady-state defect density in hydrogenated amorphous silicon
schema:name
Thermal relaxation of the deposition-induced nonequilibrium state and steady-state defect density in hydrogenated amorphous silicon Thermal relaxation of the deposition-induced nonequilibrium state and steady-state defect density in hydrogenated amorphous silicon
p:P1476
wds:Q74400069-D36F817F-4989-49EE-AA56-AA2A035AB97E
wdt:P1476
Thermal relaxation of the deposition-induced nonequilibrium state and steady-state defect density in hydrogenated amorphous silicon
p:P304
wds:Q74400069-D0CF5A71-968B-4A0A-8A79-D78030D6D30A
wdt:P304
10303-10306
p:P31
wds:Q74400069-CD6FAC0C-7A0A-4414-B9D4-E2E6ED5F49C3
wdt:P31
wd:Q13442814
p:P698
wds:Q74400069-024917A1-12DD-4F4B-8027-0936F9CF0925
wdtn:P698
n12:10009850
wdt:P698
10009850
p:P1433
wds:Q74400069-5A316FBE-5443-4259-9890-80478EDB9130
wdt:P1433
wd:Q2284414
p:P433
wds:Q74400069-37F79AA0-4FA8-4F73-9824-9247FB53BC82
p:P478
wds:Q74400069-4353DB01-CEAB-4596-B7F5-317E75092897
wdt:P433
15
wdt:P478
49
p:P1104
wds:Q74400069-6F1DC56A-21FC-409C-BB59-909FDA503F3F
wdt:P1104
4
p:P356
wds:Q74400069-C33856D8-9438-4E21-8EAF-23302E89B26D
wdtn:P356
n11:PHYSREVB.49.10303
wdt:P356
10.1103/PHYSREVB.49.10303