This HTML5 document contains 57 embedded RDF statements represented using HTML+Microdata notation.

The embedded RDF content will be recognized by any processor of HTML5 Microdata.

Namespace Prefixes

PrefixIRI
wdthttp://www.wikidata.org/prop/direct/
wdtnhttp://www.wikidata.org/prop/direct-normalized/
schemahttp://schema.org/
rdfshttp://www.w3.org/2000/01/rdf-schema#
skoshttp://www.w3.org/2004/02/skos/core#
wikibasehttp://wikiba.se/ontology#
phttp://www.wikidata.org/prop/
n11http://dx.doi.org/10.1021/
rdfhttp://www.w3.org/1999/02/22-rdf-syntax-ns#
n10http://rdf.ncbi.nlm.nih.gov/pubchem/reference/
xsdhhttp://www.w3.org/2001/XMLSchema#
wdshttp://www.wikidata.org/entity/statement/
wdhttp://www.wikidata.org/entity/

Statements

Subject Item
wd:Q60243582
rdf:type
wikibase:Item
schema:description
article scientifique publié en 2014 im Mai 2014 veröffentlichter wissenschaftlicher Artikel scientific article published on 07 May 2014 наукова стаття, опублікована в травні 2014 wetenschappelijk artikel artículu científicu espublizáu en mayu de 2014
p:P577
wds:Q60243582-791C0861-B000-4A92-BFFE-47FEBD22C261
wdt:P577
2014-05-07T00:00:00Z
p:P407
wds:Q60243582-EF9EF2CA-91E6-4FEE-8B34-E9BB8E3AB6E5
wdt:P407
wd:Q1860
p:P2093
wds:Q60243582-5291AB38-E253-49D8-A77F-88EDACE0DB9C
wdt:P2093
Francesco Vita
rdfs:label
Fine Tuning of Lithographic Masks through Thin Films of PS-b-PMMA with Different Molar Mass by Rapid Thermal Processing Fine Tuning of Lithographic Masks through Thin Films of PS-b-PMMA with Different Molar Mass by Rapid Thermal Processing
skos:prefLabel
Fine Tuning of Lithographic Masks through Thin Films of PS-b-PMMA with Different Molar Mass by Rapid Thermal Processing Fine Tuning of Lithographic Masks through Thin Films of PS-b-PMMA with Different Molar Mass by Rapid Thermal Processing
schema:name
Fine Tuning of Lithographic Masks through Thin Films of PS-b-PMMA with Different Molar Mass by Rapid Thermal Processing Fine Tuning of Lithographic Masks through Thin Films of PS-b-PMMA with Different Molar Mass by Rapid Thermal Processing
p:P50
wds:Q60243582-A687DA90-2987-4B0B-B372-656D1CE2E9BC wds:Q60243582-D8F1BC55-514B-461B-840D-9642279D8E6F wds:Q60243582-F77E37DD-EDE1-4F1B-8A55-D6A9BE0FCA0E wds:Q60243582-63D39AFD-5FFC-4B3C-8780-56DE1FC08935 wds:Q60243582-7F44E505-8C67-4CFF-8DC3-D1047A081044 wds:Q60243582-90D13F14-73AE-437A-AC84-FD95CA44FB20 wds:Q60243582-9A8C556A-3DE2-43B3-9934-00544E961CAC wds:Q60243582-440E93FB-526F-44C3-A7A3-F5D73DEC158C wds:Q60243582-4C7FFB12-F94F-44AA-AAFF-04279B08B103
wdt:P50
wd:Q53321206 wd:Q53321224 wd:Q60249244 wd:Q42181664 wd:Q42181658 wd:Q59489230 wd:Q60249463 wd:Q53321174 wd:Q53321193
p:P1476
wds:Q60243582-9389D4E9-38F2-48C6-8A1E-B75E282F7F65
wdt:P1476
Fine tuning of lithographic masks through thin films of PS-b-PMMA with different molar mass by rapid thermal processing
p:P304
wds:Q60243582-E55FC290-AE00-4D6F-B187-DC4F2A055CE1
wdt:P304
7180-7188
p:P31
wds:Q60243582-348215F2-EE23-4C12-9CFD-08C54CDF8687
wdt:P31
wd:Q13442814
p:P921
wds:Q60243582-341FE84D-8CE8-47A9-B0EC-BE275CA19B0C
wdt:P921
wd:Q1137203
p:P698
wds:Q60243582-7B1932C4-4635-43E8-A821-0BE988AB5DDB
wdtn:P698
n10:24738855
wdt:P698
24738855
p:P1433
wds:Q60243582-365E30E6-2D5C-457A-A581-5628248424B2
wdt:P1433
wd:Q2819060
p:P433
wds:Q60243582-CC211235-0E3E-41EF-83D9-8C125935843C
p:P478
wds:Q60243582-6EBB7608-9A3E-445B-B198-EF2C440ED80A
wdt:P433
10
wdt:P478
6
p:P356
wds:Q60243582-E6417A0F-B33D-46A6-980B-1740999B3A63
wdtn:P356
n11:AM5003074
wdt:P356
10.1021/AM5003074