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im Mai 2014 veröffentlichter wissenschaftlicher Artikel наукова стаття, опублікована в травні 2014 wetenschappelijk artikel
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Xuwen Liu Eugene Karwacki Helena Ronkainen Iain Buchanan Markus Bosund Lauri Kilpi Eero Haimi Mika Vähä-Nissi
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Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
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Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
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Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
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Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
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10.1016/J.TSF.2014.02.087