About: Interface of tantalum oxide films on silicon by UV annealing at low temperature

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About: Interface of tantalum oxide films on silicon by UV annealing at low temperature Goto Sponge NotDistinct Permalink

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scholarly article by Q. Fang et al published March 2003 in Thin Solid Films

Attributes	Values
rdf:type	Item
description	wetenschappelijk artikel (nl) наукова стаття, опублікована в березні 2003 (uk) im März 2003 veröffentlichter wissenschaftlicher Artikel (de) article scientifique publié en 2003 (fr) scholarly article by Q. Fang et al published March 2003 in Thin Solid Films (en)
publication date	wds:Q63790241-1437AB39-89D4-41CC-BC40-88F20228A514
publication date	2003-03-01 00:00:00Z (xsd:dateTime)
cites work	wds:Q63790241-572395C9-9C5A-498E-8EF0-3BB6CCC3E103 wds:Q63790241-A5589790-0D6D-4106-96A8-5DB761603EFA wds:Q63790241-ADE2B7F0-AD97-4EAA-9CA5-A6EC972D216D wds:Q63790241-B0147E99-7B3E-4FC7-B09B-419052638639
cites work	Formation of silicon dioxide layers during UV annealing of tantalum pentoxide film Photo-deposition of tantalum pentoxide film using 222 nm excimer lamps UV annealing of ultrathin tantalum oxide films Characterisation of ultraviolet annealed tantalum oxide films deposited by photo-CVD using 172 nm excimer lamp
author name string	wds:Q63790241-09DB5E35-B093-4F7F-889E-B33E5FB335F6 wds:Q63790241-3E8C131C-698F-4B9B-A07C-58B13643AC44 wds:Q63790241-4F34980F-504D-43E9-AE9E-1240A691C7E6 wds:Q63790241-5138C558-FC86-4AA5-9EC7-171931698F25 wds:Q63790241-80AA5FD6-4D91-4932-90CC-F7502DCE1E52 wds:Q63790241-816B8144-F5DD-4ECD-A3D8-395390B302F6 wds:Q63790241-A50C9EC5-9522-455D-B86F-A581885DC175 wds:Q63790241-B8258D62-FD49-4F14-B183-38430B9C365D wds:Q63790241-B9A4491C-A5F0-4940-80EC-B468A0D6BAEA wds:Q63790241-BE718B84-BC47-488C-BBF7-84362355015F wds:Q63790241-CF1EE056-8E60-4BC5-96BA-BDF9122F99CD wds:Q63790241-F6577B6E-9509-4234-AE24-14A32EC04E4B
author name string	Q. Fang H. Davies Z.M. Wang C. Jimenez P.K. Hurley B.J. O'Sullivan Ian W. Boyd J.-Y. Zhang J.X. Wu J.-P. Senateur M.A. Audier T.L. Leedham
rdfs:label	Interface of tantalum oxide films on silicon by UV annealing at low temperature (en) Interface of tantalum oxide films on silicon by UV annealing at low temperature (nl)
skos:prefLabel	Interface of tantalum oxide films on silicon by UV annealing at low temperature (en) Interface of tantalum oxide films on silicon by UV annealing at low temperature (nl)
name	Interface of tantalum oxide films on silicon by UV annealing at low temperature (en) Interface of tantalum oxide films on silicon by UV annealing at low temperature (nl)
title	wds:Q63790241-D36D9C56-0A6F-4ADB-87A6-C22C80D2AB94
title	Interface of tantalum oxide films on silicon by UV annealing at low temperature (en)
page(s)	wds:Q63790241-665EF7E9-71E3-4E58-828B-415BD9332A30
page(s)	248-252
instance of	wds:Q63790241-07EFD101-B094-49FE-94E3-0538EE5AFF69
instance of	scholarly article
main subject	wds:Q63790241-206028BD-C1EF-4F32-B640-B6669F117EF0
main subject	tantalum
published in	wds:Q63790241-2822F2F7-4674-459E-870B-2E643E4A42BA
published in	Thin Solid Films
issue	wds:Q63790241-9A223628-482A-42FB-8435-5A847958F2D4
volume	wds:Q63790241-08501DEB-6733-4489-8E6E-4C34523DC7B7
issue	1-2
volume	428
DOI	wds:Q63790241-465B1421-A996-44BA-9F0F-E37B0B2BA3B6
DOI	http://dx.doi.org/10.1016/S0040-6090(02)01280-4
DOI	10.1016/S0040-6090(02)01280-4
is about of	https://www.wikidata.org/wiki/Special:EntityData/Q63790241
is cites work of	Interface of ultrathin HfO2 films deposited by UV-photo-CVD
is cites work of	wds:Q63790235-4363334D-DF30-4D57-8A87-91350A9EB79F

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