About: Influence of the PVD sputtering method on structural characteristics of SiCN-coatings — Comparison of RF, DC and HiPIMS sputtering and target configurations

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About: Influence of the PVD sputtering method on structural characteristics of SiCN-coatings — Comparison of RF, DC and HiPIMS sputtering and target configurations Goto Sponge NotDistinct Permalink

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Attributes	Values
rdf:type	Item
description	wetenschappelijk artikel (nl) наукова стаття, опублікована в липні 2011 (uk)
publication date	wds:Q62681779-6B0297E8-3FEC-4810-81B7-B3E597EE46A7
publication date	2011-07-01 00:00:00Z (xsd:dateTime)
author name string	wds:Q62681779-3DD72877-FACC-40C4-81B5-56A8D464B9D9 wds:Q62681779-B8A21DCD-5419-4706-B5B5-55254EFDE39F
author name string	Christina Berger Casper Pusch
rdfs:label	Influence of the PVD sputtering method on structural characteristics of SiCN-coatings — Comparison of RF, DC and HiPIMS sputtering and target configurations (en) Influence of the PVD sputtering method on structural characteristics of SiCN-coatings — Comparison of RF, DC and HiPIMS sputtering and target configurations (nl)
skos:prefLabel	Influence of the PVD sputtering method on structural characteristics of SiCN-coatings — Comparison of RF, DC and HiPIMS sputtering and target configurations (en) Influence of the PVD sputtering method on structural characteristics of SiCN-coatings — Comparison of RF, DC and HiPIMS sputtering and target configurations (nl)
name	Influence of the PVD sputtering method on structural characteristics of SiCN-coatings — Comparison of RF, DC and HiPIMS sputtering and target configurations (en) Influence of the PVD sputtering method on structural characteristics of SiCN-coatings — Comparison of RF, DC and HiPIMS sputtering and target configurations (nl)
author	wds:Q62681779-0410B5B1-5867-4B04-B590-738EAD2F7D55 wds:Q62681779-38F22047-2152-4031-81B8-0D1363959EFF wds:Q62681779-C167EB3C-C871-400D-80A7-F415F0AB8750 wds:Q62681779-E76DA5C5-FD22-468B-86A7-C2FE4DF9E92F
author	Ralf Riedel Emanuel Ionescu Holger Hoche Andreas Klein
title	wds:Q62681779-F8D91E85-8B09-4014-BC14-F61D35D6A8BE
title	Influence of the PVD sputtering method on structural characteristics of SiCN-coatings — Comparison of RF, DC and HiPIMS sputtering and target configurations (en)
page(s)	wds:Q62681779-77B6F5DF-9A92-4070-A8DE-9BEE68A42A06
page(s)	S119-S123
instance of	wds:Q62681779-5A2E0974-C246-4A0E-9F5E-011B6BA9C263
instance of	scholarly article
main subject	wds:Q62681779-7DAF0B78-3358-4E00-A354-5DB36BDFDD77
main subject	condensed matter physics
published in	wds:Q62681779-1BFEE568-5FEB-4C8E-970F-DC2B0CE8EF6B
published in	Surface & Coatings Technology
volume	wds:Q62681779-6F38469B-9F75-4D79-BC5E-C76E379CB548
volume	205
DOI	wds:Q62681779-06063E89-C411-48C0-BDE6-3AC99536E38F
DOI	http://dx.doi.org/10.1016/J.SURFCOAT.2011.04.095
DOI	10.1016/J.SURFCOAT.2011.04.095
is about of	https://www.wikidata.org/wiki/Special:EntityData/Q62681779
is cites work of	Effect of Nitrogen Doping and Temperature on Mechanical Durability of Silicon Carbide Thin Films.
is cites work of	wds:Q55638516-E12CEB6E-7DAB-40E7-9D28-0BFA5BFFDF63

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