About: Constantin Vahlas

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An Entity of Type : wikibase:Item, within Data Space : wikidata.demo.openlinksw.com associated with source document(s)

researcher ORCID ID = 0000-0001-5911-0296

Attributes	Values
rdf:type	Item
description	forskare (sv) 연구원 (ko) 研究者 (ja) wetenschapper (nl) дослідник (uk) изилдөөчү (ky) 研究者 (zh) researcher ORCID ID = 0000-0001-5911-0296 (en)
exact match	wds:Q60160816-3223477D-AEC1-4BB3-8B3F-F8AF94F7F90E
exact match	https://scigraph.springernature.com/person.010367457445.48
rdfs:label	Constantin Vahlas (en) Constantin Vahlas (es) Constantin Vahlas (nl) Constantin Vahlas (ast)
skos:prefLabel	Constantin Vahlas (en) Constantin Vahlas (es) Constantin Vahlas (nl) Constantin Vahlas (ast)
name	Constantin Vahlas (en) Constantin Vahlas (es) Constantin Vahlas (nl) Constantin Vahlas (ast)
Scopus author ID	wds:Q60160816-A38B5A60-A65D-47A2-ACF6-9B2BC322794C
Scopus author ID	7004669898
instance of	wds:Q60160816-6ACCD377-7235-40A3-B2AC-DA8CF4AE55AD
instance of	Homo sapiens
occupation	wds:Q60160816-74B6E95A-DD99-4D2F-8EBC-30E7203B9498
employer	wds:Q60160816-0EA6FBA3-1C8A-4472-B974-E2DF40E4E8EF
sex or gender	wds:Q60160816-2a9ecee1-49f1-7d87-4fb1-211bdc150d14
VIAF ID	wds:Q60160816-8FFFB048-A2DF-47B2-A3EE-81B65FAF9325
GND ID	wds:Q60160816-9929921c-565d-482f-8c5f-d77997284cd5
Library of Congress authority ID	wds:Q60160816-93AC4F27-929E-4993-A133-AD6C7B2AEEB9
IdRef ID	wds:Q60160816-3395C51C-C56C-4DC0-A7DE-9C90C6C9D3F4
educated at	wds:Q60160816-9F4354E8-54B0-4DA4-9184-886828DF31B3
WorldCat Identities ID (superseded)	wds:Q60160816-D5726CB4-8BFF-4B35-987B-DEB65D51DF89
National Library of Israel J9U ID	wds:Q60160816-9BDC975A-622B-4C2B-943B-7930986E6A53
VIAF ID	http://viaf.org/viaf/56286277
GND ID	https://d-nb.info/gnd/173912710
Library of Congress authority ID	http://id.loc.gov/authorities/names/no2002083123
IdRef ID	http://www.idref.fr/068631081/id
occupation	researcher
employer	Délégation Midi Pyrénées
sex or gender	male
VIAF ID	56286277
GND ID	173912710
Library of Congress authority ID	no2002083123
IdRef ID	068631081
educated at	Grenoble Institute of Technology
WorldCat Identities ID (superseded)	lccn-no2002083123
National Library of Israel J9U ID	987007384037905171
ORCID iD	wds:Q60160816-1D4B7B3B-CFFC-49B2-BFD8-4C17D8A27C50
Dimensions author ID	wds:Q60160816-92905D87-4C8A-48D5-93F5-CE4A0AAE86C2
ORCID iD	https://orcid.org/0000-0001-5911-0296
ORCID iD	0000-0001-5911-0296
Dimensions author ID	010367457445.48
ResearcherID	wds:Q60160816-80DA8DDF-D67D-4F0C-B9AA-DBA6E7954E67
ResearcherID	F-7160-2019
is owl:sameAs of	Constantin Vahlas
is about of	https://www.wikidata.org/wiki/Special:EntityData/Q60160816
is author of	Nanoenergetic Materials for MEMS: A Review Chemical Vapor Deposition of Al13 Fe4 Highly Selective Catalytic Films for the Semi-Hydrogenation of Acetylene Chemical vapor deposition of low reflective cobalt (II) oxide films Toward a computational and experimental model of a poly-epoxy surface Ballistic and molecular dynamics simulations of aluminum deposition in micro-trenches Monitoring microstructure and phase transitions in thin films by high-temperature resistivity measurements CVD of Pure Copper Films from Amidinate Precursor Conformity of Aluminum Thin Films Deposited onto Micro-Patterned Silicon Wafers by Pulsed Laser Deposition, Magnetron Sputtering, and CVD Functionalization of, and Deposition on Complex-Shaped Surfaces: Vacuum Processes, Materials, Models, Challenges, and Methods SUBLIBOX: A Proprietary Solvent Free Method for Intense Vaporization of Solid Compounds Reaction and Transport Interplay in Al MOCVD Investigated Through Experiments and Computational Fluid Dynamic Analysis Microstructural and mechanical properties of powder NiCoCrAlYTa superalloy consolidated by spark plasma sintering Microstructural characterization of Ru-doped NiCoCrAlYTa coupons treated by thermal oxidation Electrochemical Behavior of Chemical Vapor Deposited Protective Aluminum Oxide Coatings on Ti6242 Titanium Alloy Aluminium tri-iso-propoxide: Shelf life, transport properties, and decomposition kinetics for the low temperature processing of aluminium oxide-based coatings An experimental and computational analysis of a MOCVD process for the growth of Al films using DMEAA Thermal behaviour of CpCuPEt3 in gas phase and Cu thin films processing Iron Thin Films from Fe(CO)[sub 5] and FeCp[sub 2]∕H[sub 2]O under Atmospheric Pressure Thermodynamic study of the thermal degradation of SiC-based fibres: Influence of SiC grain size A thermodynamic and experimental approach to TaSi2 chemical vapour deposition A thermodynamic evaluation of four Si-M (M = Mo, Ta, Ti, W) binary systems Parametric study for the growth of carbon nanotubes by catalytic chemical vapor deposition in a fluidized bed reactor Mechanical and barrier properties of MOCVD processed alumina coatings on Ti6Al4V titanium alloy Principles and applications of CVD powder technology Alumina thin films prepared by direct liquid injection chemical vapor deposition of dimethylaluminum isopropoxide: a process-structure investigation Corrosion protection of 304L stainless steel by chemical vapor deposited alumina coatings Al–Cu intermetallic coatings processed by sequential metalorganic chemical vapour deposition and post-deposition annealing Metallurgy of Complex Metallic Alloys A Delivery System for Precursor Vapors Based on Sublimation in a Fluidized Bed CVD and Powders: A Great Potential to Create New Materials Hydrodynamic study of fine metallic powders in an original spouted bed contactor in view of chemical vapor deposition treatments Thermodynamic study and characterization of low pressure chemically vapor deposited silicon oxynitride films from tetraethylorthosilicate, dichlorosilane and ammonia gas mixtures Low pressure chemical vapor deposition from TEOS–NH3 mixtures: thermochemical study of the process considering kinetic data On the thermal degradation of lox-M tyranno® fibres Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties Process-structure-properties relationship in direct liquid injection chemical vapor deposition of amorphous alumina from aluminum tri-isopropoxide Metallization of polymer composites by metalorganic chemical vapor deposition of Cu: Surface functionalization driven films characteristics Mass Spectrometric Monitoring of the Gas Phase during the CVD of Copper from Copper Cyclopentadienyl Triethylphosphine Decomposition Schemes of Copper(I) N , N ′-Diisopropylacetamidinate During Chemical Vapor Deposition of Copper Chemical Vapor Deposition of Iron, Iron Carbides, and Iron Nitride Films from Amidinate Precursors

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