About: The influence of annealing on yttrium oxide thin film deposited by reactive magnetron sputtering: Process and microstructure

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scholarly article by Y. Mao et al published January 2017 in Nuclear Materials and Energy

Attributes	Values
rdf:type	Item
description	wetenschappelijk artikel (nl) наукова стаття, опублікована в січні 2017 (uk) article scientifique publié en 2017 (fr) scholarly article by Y. Mao et al published January 2017 in Nuclear Materials and Energy (en)
publication date	wds:Q57754655-CD75AD1A-454F-4F34-8F7C-88770D5BBE30
publication date	2017-01-01 00:00:00Z (xsd:dateTime)
author name string	wds:Q57754655-07B291E4-9244-4B1F-A23A-158EBA4238D1 wds:Q57754655-2AEF5E5B-7BFD-4D2F-B9A0-2713C7456348 wds:Q57754655-3E3E1FAC-881F-48E9-AD0F-4718283DEA7F wds:Q57754655-4F1E3404-435D-4903-A4BE-D70E80F51018 wds:Q57754655-A334B9E6-1306-4D60-9B4F-5A2B2E344819 wds:Q57754655-A6AD78C2-916E-44AD-ACDD-737E0B110EE0 wds:Q57754655-D19DB920-B82A-4E5A-8162-4EC3D252C4B0 wds:Q57754655-FBA2A4A6-8558-43AA-B6A0-4B0CB6C430F3
author name string	Y. Mao J. Steffens Ch. Linsmeier A. Houben A. Terra J. Engels J.W. Coenen M. Rasinski
rdfs:label	The influence of annealing on yttrium oxide thin film deposited by reactive magnetron sputtering: Process and microstructure (en) The influence of annealing on yttrium oxide thin film deposited by reactive magnetron sputtering: Process and microstructure (nl)
skos:prefLabel	The influence of annealing on yttrium oxide thin film deposited by reactive magnetron sputtering: Process and microstructure (en) The influence of annealing on yttrium oxide thin film deposited by reactive magnetron sputtering: Process and microstructure (nl)
name	The influence of annealing on yttrium oxide thin film deposited by reactive magnetron sputtering: Process and microstructure (en) The influence of annealing on yttrium oxide thin film deposited by reactive magnetron sputtering: Process and microstructure (nl)
title	wds:Q57754655-8CF38FE1-0612-4C03-A589-FDCD8B23E09B
title	The influence of annealing on yttrium oxide thin film deposited by reactive magnetron sputtering: Process and microstructure (en)
page(s)	wds:Q57754655-2EAA1D6D-F741-4972-B67E-7B1A39335EBB
page(s)	1-8
instance of	wds:Q57754655-CBEE7B57-D3E3-4077-84C1-4F80E23B332A
instance of	scholarly article
main subject	wds:Q57754655-8AD63535-28B7-4AEE-8DB0-43A5CC2844D5 wds:Q57754655-9AB5957B-64BE-47BB-BCE6-6DF668ED4F29 wds:Q57754655-E6EAB365-A59C-49CF-B87E-CB4CD40F2CE9
main subject	microstructure yttrium thin film
published in	wds:Q57754655-3786F017-051E-4CAF-8277-C13A9738219E
published in	Nuclear Materials and Energy
volume	wds:Q57754655-B3D69A33-D6FB-4535-A201-BE7D9B328B85
volume	10
DOI	wds:Q57754655-1CDC1979-810A-4F20-A997-7F895F0B6D3A
DOI	http://dx.doi.org/10.1016/J.NME.2016.12.031
DOI	10.1016/J.NME.2016.12.031
is about of	https://www.wikidata.org/wiki/Special:EntityData/Q57754655
is cites work of	Novel Methods for Prevention of Hydrogen Embrittlement in Iron.
is cites work of	wds:Q47104047-C3260C15-B6BD-4308-98F6-581AB2CF8B16

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