About: Properties of hafnium oxide films grown by atomic layer deposition from hafnium tetraiodide and oxygen

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scholarly article by Kaupo Kukli et al published 15 November 2002 in Journal of Applied Physics

Attributes	Values
rdf:type	Item
description	artículu científicu (ast) wetenschappelijk artikel (nl) наукова стаття, опублікована в листопаді 2002 (uk) article scientifique publié en novembre 2002 (fr) im November 2002 veröffentlichter wissenschaftlicher Artikel (de) scholarly article by Kaupo Kukli et al published 15 November 2002 in Journal of Applied Physics (en)
publication date	wds:Q57398035-BE4E50DF-3B4F-48CB-B24D-BB49ABE3E46A
publication date	2002-11-15 00:00:00Z (xsd:dateTime)
cites work	wds:Q57398035-8D174CC7-1487-4175-AEF7-96A07D5F8B7D
cites work	Kinetics of the Iodide Titanium Process by the Thermal Decomposition of Titanium Tetraiodide
author name string	wds:Q57398035-DC8B68FF-46E9-4390-B1AD-B1B6EE958462 wds:Q57398035-DD5BCA70-D1F4-4E16-8A53-BC18177CBD9B
author name string	Jaan Aarik Jun Lu
rdfs:label	Properties of hafnium oxide films grown by atomic layer deposition from hafnium tetraiodide and oxygen (en) Properties of hafnium oxide films grown by atomic layer deposition from hafnium tetraiodide and oxygen (nl)
skos:prefLabel	Properties of hafnium oxide films grown by atomic layer deposition from hafnium tetraiodide and oxygen (en) Properties of hafnium oxide films grown by atomic layer deposition from hafnium tetraiodide and oxygen (nl)
name	Properties of hafnium oxide films grown by atomic layer deposition from hafnium tetraiodide and oxygen (en) Properties of hafnium oxide films grown by atomic layer deposition from hafnium tetraiodide and oxygen (nl)
author	wds:Q57398035-0897A6E6-8AC3-4E04-B492-B345411545EF wds:Q57398035-563C5866-C934-4D23-BF9E-129A5C42602B wds:Q57398035-83F1238A-94F1-4018-8635-01FBC22EF2AF wds:Q57398035-985F7283-FBB1-4B10-AC80-490A71BFD012 wds:Q57398035-CAE100D7-2342-4700-A19F-73B5673B4A15 wds:Q57398035-CE9EA608-18A1-447C-9E91-3F1E836A93AC
author	Markku Leskela Mikko Ritala Timo Sajavaara Kaupo Kukli Jonas Sundqvist Anders Hårsta
title	wds:Q57398035-731EE3C2-1EBF-4E3E-937B-21D165AE4251
title	Properties of hafnium oxide films grown by atomic layer deposition from hafnium tetraiodide and oxygen (en)
page(s)	wds:Q57398035-88DE2E3F-B5E8-4C5F-BC89-C90198456047
page(s)	5698-5703
instance of	wds:Q57398035-1AFF7774-4A7F-4938-9156-0607C17F2145
instance of	scholarly article
main subject	wds:Q57398035-0B36BFEA-2D86-4E44-8E14-9D4D9ABD73CB
main subject	hafnium
published in	wds:Q57398035-07F4E5AE-E175-43E6-829B-B3C495EF9A94
published in	Journal of Applied Physics
issue	wds:Q57398035-1D0644C2-0811-43C6-A2B8-6A1FA4C66BCA
volume	wds:Q57398035-A285FF12-F151-42C8-8CC4-F6AE6597EB20
issue	10
volume	92
DOI	wds:Q57398035-0DB49F38-CAC9-4BCB-8695-EA001839855D
DOI	http://dx.doi.org/10.1063/1.1515107
DOI	10.1063/1.1515107
is about of	https://www.wikidata.org/wiki/Special:EntityData/Q57398035
is cites work of	Atomic layer deposition of hafnium dioxide thin films from hafnium tetrakis(dimethylamide) and water
is cites work of	wds:Q57397959-09937257-058B-4230-AF51-9E6814E90BF9

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