About: Journal of vacuum science & technology. an official journal of the American Vacuum Society. B, Microelectronics processing and phenomena

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journal

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rdf:type	Item
description	journal (en) revista científica (es) ساینَسی رِسالہٕ (ks) revue scientifique (fr) науковий журнал (uk) wissenschaftliche Fachzeitschrift (de) wetenschappelijk tijdschrift van AIP Publishing (nl)
language of work or name	wds:Q29043658-40909B10-467A-472E-969A-87B79E1F8D47
language of work or name	English
Scilit journal ID	wds:Q29043658-2273FE67-78A5-48A5-8551-0DFC10AD4AD8
Crossref journal ID	wds:Q29043658-EACA4C17-824E-40C7-9625-EFC2C264E9C4
Scilit journal ID	1393127
Crossref journal ID	5527
rdfs:label	Journal of vacuum science & technology. an official journal of the American Vacuum Society. B, Microelectronics processing and phenomena (en) Journal of vacuum science & technology. an official journal of the American Vacuum Society. B, Microelectronics processing and phenomena (es) Journal of vacuum science & technology. an official journal of the American Vacuum Society. B, Microelectronics processing and phenomena (nl) Journal of vacuum science & technology. an official journal of the American Vacuum Society. B, Microelectronics processing and phenomena (ast)
skos:prefLabel	Journal of vacuum science & technology. an official journal of the American Vacuum Society. B, Microelectronics processing and phenomena (en) Journal of vacuum science & technology. an official journal of the American Vacuum Society. B, Microelectronics processing and phenomena (es) Journal of vacuum science & technology. an official journal of the American Vacuum Society. B, Microelectronics processing and phenomena (nl) Journal of vacuum science & technology. an official journal of the American Vacuum Society. B, Microelectronics processing and phenomena (ast)
name	Journal of vacuum science & technology. an official journal of the American Vacuum Society. B, Microelectronics processing and phenomena (en) Journal of vacuum science & technology. an official journal of the American Vacuum Society. B, Microelectronics processing and phenomena (es) Journal of vacuum science & technology. an official journal of the American Vacuum Society. B, Microelectronics processing and phenomena (nl) Journal of vacuum science & technology. an official journal of the American Vacuum Society. B, Microelectronics processing and phenomena (ast)
title	wds:Q29043658-B4C3CC4F-5728-401E-B004-ADA885FBAD62
title	Journal of vacuum science & technology. B, Microelectronics processing and phenomena (en)
ACNP journal ID	wds:Q29043658-728560EA-00AC-4CB2-821D-5FE5826B114F wds:Q29043658-802C4797-3214-495D-B707-77E0EDE73075
HAL journal ID	wds:Q29043658-1DE9F76F-3AAE-4673-A5F9-56158663DAC2
ACNP journal ID	53908 2981625
HAL journal ID	16452
instance of	wds:Q29043658-F55094BB-E51D-4CDA-A1B2-8AC260576478
instance of	scientific journal
publisher	wds:Q29043658-E9039440-C072-47F2-AEE5-2D5661E456FC
publisher	AIP Publishing
skos:altLabel	Journal of vacuum science & technology. B, Microelectronics processing and phenomena (en)
OpenAlex ID	wds:Q29043658-C8DCC79D-0079-4362-8C7C-78F5EBD184BE
country of origin	wds:Q29043658-21BC56EA-6B3F-4402-81E9-3E33CA881A4D
official website	wds:Q29043658-10310AC0-324A-4516-A570-65D42CBB3BFE
OpenAlex ID	V4210191927
country of origin	United States of America
official website	http://scitation.aip.org/jvst/
Scopus source ID	wds:Q29043658-8F5B56AA-3A14-4A9F-8682-A76E94704A38
ISSN	wds:Q29043658-9D4CC375-4D86-439A-8FF1-247C35E68728 wds:Q29043658-B47C81B3-98E7-4211-B773-0383C767F248
ISSN-L	wds:Q29043658-917EE0C5-DBC1-47E2-A2BB-2B9C28DA0313
indexed in bibliographic review	wds:Q29043658-15529D3C-8D58-44DD-AC2B-A863EC1886FF
ISSN	urn:ISSN:0734-211X urn:ISSN:2327-9877
ISSN-L	http://issn.org/resource/ISSN/0734-211X
Scopus source ID	32160
ISSN	0734-211X 2327-9877
ISSN-L	0734-211X
indexed in bibliographic review	Scopus
is about of	https://www.wikidata.org/wiki/Special:EntityData/Q29043658
is published in of	Persistence pays off: Sir Charles Oatley and the scanning electron microscope Micro∕nanotribological study of perfluorosilane SAMs for antistiction and low wear Adhesion and stiction: Mechanisms, measurement techniques, and methods for reduction Blind restoration method of scanning tunneling and atomic force microscopy images Blind reconstruction of scanning probe image data Scanned probe microscope tip characterization without calibrated tip characterizers Focused ion beam patterning of III–V crystals at low temperature: A method for improving the ion-induced defect localization Nanoimprint lithography Semiconductor characterization by scanning force microscope surface photovoltage microscopy Quantitative evaluation of local charge trapping in dielectric stacked gate structures using Kelvin probe force microscopy Protein binding on thermally grown silicon dioxide Initial lithography results from the digital electrostatic e-beam array lithography concept Growth and simulation of high-aspect ratio nanopillars by primary and secondary electron-induced deposition Polymer cell culture substrates with combined nanotopographical patterns and micropatterned chemical domains Topas-based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography Preparation of site specific transmission electron microscopy plan-view specimens using a focused ion beam system A low-temperature atomic force/scanning tunneling microscope for ultrahigh vacuum Removing drift from scanning probe microscope images of periodic samples Reversal imprinting by transferring polymer from mold to substrate Structure and electronic states on reduced SrTiO3(110) surface observed by scanning tunneling microscopy and spectroscopy Cross beam lithography (FIB+EBL) and dip pen nanolithography for nanoparticle conductivity measurements Nanopatterning of polyfluorene derivative using electron-beam lithography Proton and anion distribution and line edge roughness of chemically amplified electron beam resist Experimental determination of valence band maxima for SrTiO[sub 3], TiO[sub 2], and SrO and the associated valence band offsets with Si(001) Preparation of sharp polycrystalline tungsten tips for scanning tunneling microscopy imaging Ultrahigh molecular weight poly(methyl methacrylate) as an electron-beam resist In situ ballistic-carrier spectroscopy on epitaxial CoSi2/Si(111) and Si(100) Spin relaxation of conduction electrons Nanoimprint lithography in the cyclic olefin copolymer, Topas[sup ®], a highly ultraviolet-transparent and chemically resistant thermoplast Electron induced chemical nanolithography with self-assembled monolayers Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition Electrical characterization of micro-organisms using microfabricated devices Extending optics to 50 nm and beyond with immersion lithography Plasma-deposited organosilicon thin films as dry resists for deep ultraviolet lithography Submicron technology for III-nitride semiconductors Conducting atomic force microscopy study of silicon dioxide breakdown Phonons on reconstructed silicon surfaces Magnetotransport through mesoscopic antidot arrays Spatial quantization in GaAs–AlGaAs multiple quantum dots High resolution atomic force microscopy potentiometry Fabrication of submicron suspended structures by laser and atomic force microscopy lithography on aluminum combined with reactive ion etching

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