About: Nanomechanical Mass Sensor for Spatially Resolved Ultrasensitive Monitoring of Deposition Rates in Stencil Lithography

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About: Nanomechanical Mass Sensor for Spatially Resolved Ultrasensitive Monitoring of Deposition Rates in Stencil Lithography Goto Sponge NotDistinct Permalink

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scientific article published on 01 February 2009

Attributes	Values
rdf:type	Item
description	wetenschappelijk artikel (nl) наукова стаття, опублікована в грудні 2008 (uk) im Februar 2009 veröffentlichter wissenschaftlicher Artikel (de) artículu científicu espublizáu en febreru de 2009 (ast) artikull shkencor i botuar më 01 shkurt 2009 (sq) scientific article published on 01 February 2009 (en)
publication date	wds:Q61825316-A7247B1A-FBF1-475A-944B-14A13425E262
publication date	2009-02-01 00:00:00Z (xsd:dateTime)
author name string	wds:Q61825316-31FDAB37-D875-4865-A949-7A9BB445168B wds:Q61825316-77CDCBF2-AE9F-4E8F-B2AD-C6AA3B7938E6 wds:Q61825316-7C3B5574-A3F9-4C32-9C8E-D5C6A3D14DB0 wds:Q61825316-7F8FA7DA-BE5C-4EBD-BD64-48E7D06806C9
author name string	Juergen Brugger Julien Arcamone Jaume Verd Marc van den Boogaart
rdfs:label	Nanomechanical Mass Sensor for Spatially Resolved Ultrasensitive Monitoring of Deposition Rates in Stencil Lithography (en) Nanomechanical Mass Sensor for Spatially Resolved Ultrasensitive Monitoring of Deposition Rates in Stencil Lithography (nl) Nanomechanical Mass Sensor for Spatially Resolved Ultrasensitive Monitoring of Deposition Rates in Stencil Lithography (sq)
skos:prefLabel	Nanomechanical Mass Sensor for Spatially Resolved Ultrasensitive Monitoring of Deposition Rates in Stencil Lithography (en) Nanomechanical Mass Sensor for Spatially Resolved Ultrasensitive Monitoring of Deposition Rates in Stencil Lithography (nl) Nanomechanical Mass Sensor for Spatially Resolved Ultrasensitive Monitoring of Deposition Rates in Stencil Lithography (sq)
name	Nanomechanical Mass Sensor for Spatially Resolved Ultrasensitive Monitoring of Deposition Rates in Stencil Lithography (en) Nanomechanical Mass Sensor for Spatially Resolved Ultrasensitive Monitoring of Deposition Rates in Stencil Lithography (nl) Nanomechanical Mass Sensor for Spatially Resolved Ultrasensitive Monitoring of Deposition Rates in Stencil Lithography (sq)
author	wds:Q61825316-017CA0AB-701C-4D77-8833-612FA9083A22 wds:Q61825316-339A85DF-AAC5-49E0-8F01-2AE449AB0897 wds:Q61825316-76EF14E9-06B8-449C-8C8C-6C319AB758A1 wds:Q61825316-D1948EE4-2FA8-4045-98AC-9A11E3E065D2 wds:Q61825316-D5023D6F-C808-48E0-AA6A-3F8F5141417B
author	Francesc Pérez-Murano Arantxa Uranga Nuria Barniol Marc Sansa Gabriel Abadal
title	wds:Q61825316-0A3F8837-053B-46C5-9E8A-13581216E5BD
title	Nanomechanical mass sensor for spatially resolved ultrasensitive monitoring of deposition rates in stencil lithography (en)
page(s)	wds:Q61825316-E8A1960B-D8E9-4869-9D69-95A9AD60D78C
page(s)	176-180
instance of	wds:Q61825316-200C3024-04BD-4291-888B-CC3707EB9903
instance of	scholarly article
main subject	wds:Q61825316-0C51FDD7-AD27-4E65-B973-EC31B783BB3D
main subject	biotechnology
PubMed ID	wds:Q61825316-2DB99C40-E081-431C-96FE-3C0AA3FED9B8
PubMed ID	http://rdf.ncbi.nlm.nih.gov/pubchem/reference/19051184
PubMed ID	19051184
published in	wds:Q61825316-9C6C61A4-22B4-491C-88DB-C8D10C5700F3
published in	Small
issue	wds:Q61825316-037C9C13-2F74-4876-803E-F5CFE8966F99
volume	wds:Q61825316-82F6519D-D563-45AB-9A0B-EDB32D20D6DB
issue	2
volume	5
DOI	wds:Q61825316-9F01894C-6E5F-45B8-A4DD-40C33B1B98CF
DOI	http://dx.doi.org/10.1002/SMLL.200800699
DOI	10.1002/SMLL.200800699
is about of	https://www.wikidata.org/wiki/Special:EntityData/Q61825316
is cites work of	High-sensitivity linear piezoresistive transduction for nanomechanical beam resonators A 0.35-μm CMOS-MEMS Oscillator for High-Resolution Distributed Mass Detection
is cites work of	wds:Q58702010-618FB2E8-45A2-40CE-8A44-C761E9DA23EC wds:Q58888439-9DC47FEA-F07E-45AE-B70F-A54231AAEF49

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