About: Characterization of Cr–Al–C and Cr–Al–C–Y films synthesized by High Power Impulse Magnetron Sputtering at a low deposition temperature

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About: Characterization of Cr–Al–C and Cr–Al–C–Y films synthesized by High Power Impulse Magnetron Sputtering at a low deposition temperature Goto Sponge NotDistinct Permalink

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Attributes	Values
rdf:type	Item
description	wetenschappelijk artikel (nl) article scientifique publié en 2015 (fr) наукова стаття, опублікована у квітні 2015 (uk) im April 2015 veröffentlichter wissenschaftlicher Artikel (de)
publication date	wds:Q61766741-D56E05EF-500A-4FD3-88D4-8331A96A5C68
publication date	2015-04-01 00:00:00Z (xsd:dateTime)
cites work	wds:Q61766741-2A162C58-65FE-47EF-8F31-D527C0F8A2AC wds:Q61766741-4B915BE1-23C5-41E7-B2A8-A102E3577B55 wds:Q61766741-58507ABD-26D3-4EAB-8734-59D11A57695A wds:Q61766741-5F48B210-6E4E-4D52-A342-22E2D8E7ED91 wds:Q61766741-7AC0B7D7-4D33-4408-BEF4-4CDCE9D56BBD wds:Q61766741-AFB1FA91-A17C-4F1B-9093-989755D2C803 wds:Q61766741-B391909E-E2D9-4FA3-AED4-17CC7B6B0F9E wds:Q61766741-BE64A539-0AD2-424E-B40B-891AEE1601FD wds:Q61766741-CEB46A33-DB71-491C-B5DC-A27450447824 wds:Q61766741-FEA6D125-0CDC-41C7-8C92-5CF2B3A94746
cites work	Interface microstructure engineering by high power impulse magnetron sputtering for the enhancement of adhesion CrAlYN/CrN superlattice coatings deposited by the combined high power impulse magnetron sputtering/unbalanced magnetron sputtering technique Deposition and characterization of ternary thin films within the Ti–Al–C system by DC magnetron sputtering Fabrication and oxidation behavior of Cr2AlC coating on Ti6242 alloy The Mn+1AXn phases: Materials science and thin-film processing The correlation between the electronic structure and elastic properties of nanolaminates Homoepitaxial growth of Ti–Si–C MAX-phase thin films on bulk Ti3SiC2 substrates Thermal stability of Ti3SiC2 thin films Epitaxial Ti2GeC, Ti3GeC2, and Ti4GeC3 MAX-phase thin films grown by magnetron sputtering Growth and characterization of MAX-phase thin films
author name string	wds:Q61766741-70E2FD80-1810-4E14-AD53-AD2482537CD7 wds:Q61766741-77BECBAF-986A-4228-9182-84015F01F1BE wds:Q61766741-7CBAF26F-B036-41A2-8E10-100CA4CFB210 wds:Q61766741-9730A70C-2AEE-4AB8-B51E-4209EC14483B wds:Q61766741-C6902E38-5A2F-4323-9399-F57C0E71F15A
author name string	R. Boucher S. Heinze C. Leyens M. Ruhnow O. Berger
rdfs:label	Characterization of Cr–Al–C and Cr–Al–C–Y films synthesized by High Power Impulse Magnetron Sputtering at a low deposition temperature (en) Characterization of Cr–Al–C and Cr–Al–C–Y films synthesized by High Power Impulse Magnetron Sputtering at a low deposition temperature (nl)
skos:prefLabel	Characterization of Cr–Al–C and Cr–Al–C–Y films synthesized by High Power Impulse Magnetron Sputtering at a low deposition temperature (en) Characterization of Cr–Al–C and Cr–Al–C–Y films synthesized by High Power Impulse Magnetron Sputtering at a low deposition temperature (nl)
name	Characterization of Cr–Al–C and Cr–Al–C–Y films synthesized by High Power Impulse Magnetron Sputtering at a low deposition temperature (en) Characterization of Cr–Al–C and Cr–Al–C–Y films synthesized by High Power Impulse Magnetron Sputtering at a low deposition temperature (nl)
title	wds:Q61766741-049D6022-D140-47E6-8903-10A64E6C860A
title	Characterization of Cr–Al–C and Cr–Al–C–Y films synthesized by High Power Impulse Magnetron Sputtering at a low deposition temperature (en)
page(s)	wds:Q61766741-697F1A0A-F933-4270-8410-F40CE2ACCFB7
page(s)	6-11
instance of	wds:Q61766741-0CA7211B-56F4-45D7-B9C7-5F0B228BD074
instance of	scholarly article
published in	wds:Q61766741-E6D514FF-0762-43BC-9CE4-912D3B537136
published in	Thin Solid Films
volume	wds:Q61766741-BA1FA36A-5C59-464B-A49F-C0BA345A5D91
volume	580
DOI	wds:Q61766741-0FB8A24B-2701-4DD8-BB88-208E241268C8
DOI	http://dx.doi.org/10.1016/J.TSF.2015.03.008
DOI	10.1016/J.TSF.2015.03.008
is about of	https://www.wikidata.org/wiki/Special:EntityData/Q61766741

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