About: New nanostructured silicon films grown by PECVD technique under controlled powder formation conditions

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About: New nanostructured silicon films grown by PECVD technique under controlled powder formation conditions Goto Sponge NotDistinct Permalink

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Attributes	Values
rdf:type	Item
description	wetenschappelijk artikel (nl) наукова стаття, опублікована в липні 2001 (uk) im Juli 2001 veröffentlichter wissenschaftlicher Artikel (de) article scientifique publié en juillet 2001 (fr)
publication date	wds:Q58431735-9771FF59-9D38-4995-88B7-6E70B02A9B74
publication date	2001-07-01 00:00:00Z (xsd:dateTime)
cites work	wds:Q58431735-33CAC242-979E-48C7-A91E-9F1626337FBE
cites work	Role of the gas temperature and power to gas flow ratio on powder and voids formation in films grown by PECVD technique
author name string	wds:Q58431735-1BA57764-6BFE-42CA-8BD6-A525E87F69F0 wds:Q58431735-5213E798-A00E-4C12-8BC3-3DA07F1C3C5C wds:Q58431735-6E090E3C-5BC5-4E3F-B9F7-A564684C0188 wds:Q58431735-95247541-0D6F-489A-8544-32C4102FFB0D wds:Q58431735-DC265CA1-4394-4578-A754-B1090C0F08FF wds:Q58431735-E3EEE1EB-AAD9-44AE-A0C4-1F2FE67F064D
author name string	E. Fortunato R. Martins V. Silva L. Guimarães A. Cabrita P. Tonello
rdfs:label	New nanostructured silicon films grown by PECVD technique under controlled powder formation conditions (en) New nanostructured silicon films grown by PECVD technique under controlled powder formation conditions (nl)
skos:prefLabel	New nanostructured silicon films grown by PECVD technique under controlled powder formation conditions (en) New nanostructured silicon films grown by PECVD technique under controlled powder formation conditions (nl)
name	New nanostructured silicon films grown by PECVD technique under controlled powder formation conditions (en) New nanostructured silicon films grown by PECVD technique under controlled powder formation conditions (nl)
author	wds:Q58431735-46B0E262-625F-4F1B-82FA-7ED1BB3B3FC5 wds:Q58431735-F6943F97-9377-4501-ABFD-AD4BFEEFA69C
author	Hugo Águas Isabel Maria Ferreira
title	wds:Q58431735-9863CB77-7EC6-4D7A-AC50-6D98B90DAB64
title	New nanostructured silicon films grown by PECVD technique under controlled powder formation conditions (en)
page(s)	wds:Q58431735-9FEE66F7-A715-414C-8BBA-321802A2CA0E
page(s)	263-269
instance of	wds:Q58431735-7EFFE4B1-D482-4BCC-A8B0-95201B17EEBC
instance of	scholarly article
published in	wds:Q58431735-F4BA06F8-5149-4A64-B62B-ABB1140302C7
published in	Solar Energy
volume	wds:Q58431735-0D5B5CF6-2558-4B8C-983F-CF8912C2F1B9
volume	69
DOI	wds:Q58431735-6B3DDD8A-DF2D-4E56-9C3F-07664C5D5ECE
DOI	http://dx.doi.org/10.1016/S0038-092X(01)00060-3
DOI	10.1016/S0038-092X(01)00060-3
is about of	https://www.wikidata.org/wiki/Special:EntityData/Q58431735

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