About: Contribution of vacancies to relaxation in amorphous materials: A kinetic activation-relaxation technique study

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scholarly article in Physical Review B, vol. 87 no. 14, April 2013

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rdf:type	Item
description	wetenschappelijk artikel (nl) наукова стаття, опублікована у квітні 2013 (uk) im April 2013 veröffentlichter wissenschaftlicher Artikel (de) 2013 ഏപ്രില്‍ 30 നു പ്രസിദ്ധീകരിച്ച ശാസ്ത്ര ലേഖനം (ml) scholarly article in Physical Review B, vol. 87 no. 14, April 2013 (en)
publication date	wds:Q57835619-1E7ED555-57F1-4653-804D-103F025E76A4
publication date	2013-04-30 00:00:00Z (xsd:dateTime)
language of work or name	wds:Q57835619-7C58F2B7-D944-40BC-A165-7F69AF547B87
language of work or name	English
cites work	wds:Q57835619-0402183D-DD34-4CFF-B884-0E7CF391D47C wds:Q57835619-11477B13-4046-477E-9DC8-5AAAE81FAB44 wds:Q57835619-1822FB37-C00A-4C8C-84D8-AD5281BAD2A8 wds:Q57835619-3E6442A4-7313-42C2-967C-BCDC49D6D607 wds:Q57835619-4B7563D1-FC8E-41C2-9D0C-62841912EA82 wds:Q57835619-6173A7EE-8452-455D-9659-76BAA956946A wds:Q57835619-79638E43-059A-4B93-92FE-38B2451C47C4 wds:Q57835619-84CC83F6-8773-4E9D-B509-709102F30A2A wds:Q57835619-88479A8E-C5F7-491D-9D35-71CFAC1907E3 wds:Q57835619-8A578509-912E-4696-8AAA-C578EC8F5ADE wds:Q57835619-936DE2D7-898F-444C-8F85-47CFF55905C7 wds:Q57835619-A3FC2DF1-21B3-4DD6-A960-2D44483B1B90 wds:Q57835619-A6E68D2A-AF44-49FA-B344-C506F56B65F0 wds:Q57835619-BD4899CF-8E0E-4C1E-8A57-2A36D3A68B1E wds:Q57835619-BDB37178-1929-48DB-914B-2118C401710B wds:Q57835619-CF006541-4C8D-4908-9742-E8C4B543055E wds:Q57835619-D9DE027B-2521-463B-809E-C0E29A0F82B6 wds:Q57835619-F9A4D2DF-91C2-482A-BF3A-9DEADA2EDFD2
cites work	Dynamics of lennard-jones clusters: A characterization of the activation-relaxation technique Kinetic activation-relaxation technique. Kinetic activation-relaxation technique: An off-lattice self-learning kinetic Monte Carlo algorithm High-quality continuous random networks Identification of Relaxation and Diffusion Mechanisms in Amorphous Silicon Optimized energy landscape exploration using the ab initio based activation-relaxation technique. The Activation-Relaxation Technique: ART Nouveau and Kinetic ART Evolution of the Potential-Energy Surface of Amorphous Silicon Structural relaxation and defect annihilation in pure amorphous silicon Density of amorphous Si Fitting the Stillinger–Weber potential to amorphous silicon Liquidlike atomic environments act as plasticity carriers in amorphous silicon An energy basin finding algorithm for kinetic Monte Carlo acceleration Optimization of the Kinetic Activation-Relaxation Technique, an off-lattice and self-learning kinetic Monte-Carlo method Dependence of the structural relaxation of amorphous silicon on implantation temperature Energy landscape of relaxed amorphous silicon Damage evolution in low-energy ion implanted silicon Concentration and ion-energy-independent annealing kinetics during ion-implanted-defect annealing
author name string	wds:Q57835619-51D13FDE-4E01-4D5A-9FCC-77F53CDE1280
author name string	Jean-Francois Joly
rdfs:label	Contribution of vacancies to relaxation in amorphous materials: A kinetic activation-relaxation technique study (en) Contribution of vacancies to relaxation in amorphous materials: A kinetic activation-relaxation technique study (nl)
skos:prefLabel	Contribution of vacancies to relaxation in amorphous materials: A kinetic activation-relaxation technique study (en) Contribution of vacancies to relaxation in amorphous materials: A kinetic activation-relaxation technique study (nl)
name	Contribution of vacancies to relaxation in amorphous materials: A kinetic activation-relaxation technique study (en) Contribution of vacancies to relaxation in amorphous materials: A kinetic activation-relaxation technique study (nl)
author	wds:Q57835619-6845337C-24E6-4FDD-B488-FBF594B6F09B wds:Q57835619-7224815A-499D-4736-A45E-F7215A3AFBCD wds:Q57835619-92E21CE3-F8CE-4B3D-AF30-A58AF5C32D37
author	Normand Mousseau Peter Brommer Laurent Karim Béland
title	wds:Q57835619-FD76EC6C-5D92-4728-AE9D-207293492EAF
title	Contribution of vacancies to relaxation in amorphous materials: A kinetic activation-relaxation technique study (en)
instance of	wds:Q57835619-AE044F12-749B-470B-A630-32007752AEA0
instance of	scholarly article
published in	wds:Q57835619-F2D55EDE-E704-425D-8D42-66B28D286F76
published in	Physical Review B
issue	wds:Q57835619-E9DE95A8-483F-4B26-AC6D-D95247790FF8
volume	wds:Q57835619-9E471CDC-4AF1-48CD-8A6C-4D7E04B1785B
issue	14
volume	87
DOI	wds:Q57835619-47258F5E-1B5D-4311-8896-D56CF56FCBB3
DOI	http://dx.doi.org/10.1103/PHYSREVB.87.144204
DOI	10.1103/PHYSREVB.87.144204
is about of	https://www.wikidata.org/wiki/Special:EntityData/Q57835619
is cites work of	Single atom catalysts on amorphous supports: A quenched disorder perspective. A Review of Enhanced Sampling Approaches for Accelerated Molecular Dynamics Long-time relaxation of ion-bombarded silicon studied with the kinetic activation-relaxation technique: Microscopic description of slow aging in a disordered system Algorithmic developments of the kinetic activation-relaxation technique: Accessing long-time kinetics of larger and more complex systems. Understanding long-time vacancy aggregation in iron: A kinetic activation-relaxation technique study
is cites work of	wds:Q45992632-6D07B008-EB7B-47A2-A804-18A8E8BB999B wds:Q47637678-43533DB0-EE92-4752-9053-03ED8FDCD4AB wds:Q57835621-7C05BE10-A9E6-4525-AF68-BE67DB1DF8B5 wds:Q59843458-CB7C0919-F190-45FD-BB3A-3D68FA684B23 wds:Q57835616-266CC7F5-C000-4DC3-8E7D-3E3DC8CBF6CC

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