About: Formation of Nickel Silicide from Direct-Liquid-Injection Chemical-Vapor-Deposited Nickel Nitride Films

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scholarly article by Zhefeng Li et al published 2010 in Journal of the Electrochemical Society

Attributes	Values
rdf:type	Item
description	wetenschappelijk artikel (nl) наукова стаття, опублікована у 2010 (uk) article scientifique publié en 2010 (fr) im Januar 2010 veröffentlichter wissenschaftlicher Artikel (de) scholarly article by Zhefeng Li et al published 2010 in Journal of the Electrochemical Society (en)
publication date	wds:Q57641275-7D4CD01E-FE60-4B24-8D33-F7ACC6560543
publication date	2010-01-01 00:00:00Z (xsd:dateTime)
cites work	wds:Q57641275-53930E4D-26FC-4682-9BBB-F0B9944150CD wds:Q57641275-902C7EC0-5F89-479A-9846-D5552594B367 wds:Q57641275-B2DD9476-B8F6-4901-A750-D1FB0C10FA7F wds:Q57641275-DFB11E7C-86E0-4BB3-8016-AEE2FCB690DC wds:Q57641275-EC6584BD-66AA-420A-87DA-3A5E9D49D04D
cites work	Atomic layer deposition of transition metals Towards implementation of a nickel silicide process for CMOS technologies Effects of additive elements on the phase formation and morphological stability of nickel monosilicide films Ordering of Nitrogen in Nickel Nitride Ni3N Determined by Neutron Diffraction High-temperature degradation of NiSi films: Agglomeration versus NiSi2 nucleation
author name string	wds:Q57641275-2EE227AE-FFA5-4BB7-91C5-AF633B3058F6 wds:Q57641275-3AD1900E-0CB6-43B5-8A37-75FF87E71CC0 wds:Q57641275-A428637A-136F-41F4-8D37-CDDA05E8F3FF wds:Q57641275-BB3FED94-F738-4334-985D-7645E6611C59 wds:Q57641275-DD5AE73C-F2AC-4609-90CA-4A5598542BFF
author name string	Zhefeng Li Roy G. Gordon Christian Lavoie Huazhi Li Deo V. Shenai
rdfs:label	Formation of Nickel Silicide from Direct-Liquid-Injection Chemical-Vapor-Deposited Nickel Nitride Films (en) Formation of Nickel Silicide from Direct-Liquid-Injection Chemical-Vapor-Deposited Nickel Nitride Films (nl)
skos:prefLabel	Formation of Nickel Silicide from Direct-Liquid-Injection Chemical-Vapor-Deposited Nickel Nitride Films (en) Formation of Nickel Silicide from Direct-Liquid-Injection Chemical-Vapor-Deposited Nickel Nitride Films (nl)
name	Formation of Nickel Silicide from Direct-Liquid-Injection Chemical-Vapor-Deposited Nickel Nitride Films (en) Formation of Nickel Silicide from Direct-Liquid-Injection Chemical-Vapor-Deposited Nickel Nitride Films (nl)
title	wds:Q57641275-60F28BE0-4CD5-4ADE-A0FF-296498435FD0
title	Formation of Nickel Silicide from Direct-Liquid-Injection Chemical-Vapor-Deposited Nickel Nitride Films (en)
page(s)	wds:Q57641275-E9D72F44-9CB2-438A-AD91-618842A55FF5
page(s)	H679
instance of	wds:Q57641275-663759D3-3D62-4AF6-A48A-9D0CD03264B8
instance of	scholarly article
main subject	wds:Q57641275-5769bdcd-812c-453d-b723-dd0e150ef424
main subject	nickel
published in	wds:Q57641275-30E85849-BFB5-4BC4-8EB4-CD0E95576A00
published in	Journal of the Electrochemical Society
issue	wds:Q57641275-933C50FA-70BD-4515-B70C-BEE95CC0C0F2
volume	wds:Q57641275-A6DACC21-48E8-46E5-80FA-34E11B9B2B15
issue	6
volume	157
DOI	wds:Q57641275-DB62BD68-16FA-4DF9-941B-DD5E160D9F9C
DOI	http://dx.doi.org/10.1149/1.3388721
DOI	10.1149/1.3388721
is about of	https://www.wikidata.org/wiki/Special:EntityData/Q57641275

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