About: Improved Stability of Atomic Layer Deposited Amorphous TiO Photoelectrode Coatings by Thermally Induced Oxygen Defects     Goto   Sponge   NotDistinct   Permalink

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rdf:type
description
  • wetenschappelijk artikel (nl)
  • наукова стаття, опублікована в лютому 2018 (uk)
  • article scientifique publié en 2018 (fr)
  • im Februar 2018 veröffentlichter wissenschaftlicher Artikel (de)
publication date
publication date
language of work or name
language of work or name
cites work
cites work
author name string
author name string
  • Harri Ali-Löytty
  • Jesse Saari
  • Kimmo Lahtonen
  • Markku Hannula
  • Mika Valden
rdfs:label
  • Improved Stability of Atomic Layer Deposited Amorphous TiO Photoelectrode Coatings by Thermally Induced Oxygen Defects (en)
  • Improved Stability of Atomic Layer Deposited Amorphous TiO Photoelectrode Coatings by Thermally Induced Oxygen Defects (nl)
skos:prefLabel
  • Improved Stability of Atomic Layer Deposited Amorphous TiO Photoelectrode Coatings by Thermally Induced Oxygen Defects (en)
  • Improved Stability of Atomic Layer Deposited Amorphous TiO Photoelectrode Coatings by Thermally Induced Oxygen Defects (nl)
name
  • Improved Stability of Atomic Layer Deposited Amorphous TiO Photoelectrode Coatings by Thermally Induced Oxygen Defects (en)
  • Improved Stability of Atomic Layer Deposited Amorphous TiO Photoelectrode Coatings by Thermally Induced Oxygen Defects (nl)
author
author
title
title
  • Improved Stability of Atomic Layer Deposited Amorphous TiO Photoelectrode Coatings by Thermally Induced Oxygen Defects (en)
page(s)
page(s)
  • 1199-1208
instance of
instance of
main subject
main subject
PubMed ID
PubMed ID
PubMed ID
  • 30270988
published in
published in
issue
volume
issue
  • 4
volume
  • 30
DOI
DOI
DOI
  • 10.1021/ACS.CHEMMATER.7B02938
PMCID
PMCID
  • 6156093
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