About: Dynamic observations of interface propagation during silicon oxidation

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scientific article published on 01 March 1992

Attributes	Values
rdf:type	Item
description	wetenschappelijk artikel (nl) bài báo khoa học (vi) наукова стаття, опублікована в березні 1992 (uk) գիտական հոդված հրատարակված 1992 թվականի մարտի 1-ին (hy) artículu científicu espublizáu en marzu de 1992 (ast) im März 1992 veröffentlichter wissenschaftlicher Artikel (de) scientific article published on 01 March 1992 (en)
publication date	wds:Q67856926-E6212AFA-06AF-4299-BF65-8E950E0D4002
publication date	1992-03-01 00:00:00Z (xsd:dateTime)
language of work or name	wds:Q67856926-E4752F9F-BFD8-489E-B7DC-C14B24B11E3C
language of work or name	English
cites work	wds:Q67856926-F45B443E-6301-4E2D-99D6-DB1B5B315E9A
cites work	Observation of interfacial atomic steps during silicon oxidation
author name string	wds:Q67856926-E8D9BB99-119B-4576-A908-E02C3C123E50
author name string	Gibson JM
rdfs:label	Dynamic observations of interface propagation during silicon oxidation (en) Dynamic observations of interface propagation during silicon oxidation (nl)
skos:prefLabel	Dynamic observations of interface propagation during silicon oxidation (en) Dynamic observations of interface propagation during silicon oxidation (nl)
name	Dynamic observations of interface propagation during silicon oxidation (en) Dynamic observations of interface propagation during silicon oxidation (nl)
author	wds:Q67856926-8E9AF8F4-979D-41B8-A98F-F84FEB7B0775
author	Frances M. Ross
title	wds:Q67856926-06FF87D4-426C-40B3-BFA5-2DF3E3969BDA
title	Dynamic observations of interface propagation during silicon oxidation (en)
page(s)	wds:Q67856926-2B60D99A-0C87-42BB-804C-9FA82B958328
page(s)	1782-1785
instance of	wds:Q67856926-B102E3FA-8F57-4E2E-A37A-50EC9E104727
instance of	scholarly article
PubMed ID	wds:Q67856926-437D04C5-C86A-45A1-AC7F-1C894479D997
PubMed ID	http://rdf.ncbi.nlm.nih.gov/pubchem/reference/10045219
PubMed ID	10045219
published in	wds:Q67856926-2D511FB2-1111-4275-ADE2-D49D499239CA
published in	Physical Review Letters
issue	wds:Q67856926-4D08D160-D31D-482F-B604-143B2DA64B54
volume	wds:Q67856926-CC94039F-00AF-4E92-AAB4-50A7F89A8AE0
issue	11
volume	68
DOI	wds:Q67856926-1E350A60-4AEC-4389-B46A-513370600259
DOI	http://dx.doi.org/10.1103/PHYSREVLETT.68.1782
DOI	10.1103/PHYSREVLETT.68.1782
is about of	https://www.wikidata.org/wiki/Special:EntityData/Q67856926
is cites work of	A unique tool for imaging crystal growth Scanning-tunneling-microscopy observation of thermal oxide growth on Si(111)7 x 7 surfaces Microscopic dynamics of silicon oxidation Epitaxial growth mechanisms and structure of CaF2/Si(111) Direct observation of two-dimensional growth at SiO2/Si(111) interface Thermally induced interface degradation in (111) Si/SiO2 traced by electron spin resonance
is cites work of	wds:Q67856884-2D5BC03B-E6E7-4EEA-BA14-4D74CAFEFAB8 wds:Q74639174-1280C192-AA78-4F86-8A4E-25057CD68359 wds:Q78116046-5EC7E4AC-3D8D-4AA2-9034-CD9BC6D90948 wds:Q58332956-CA1627E4-7DAF-468E-83D4-D3FB440B7239 wds:Q74390199-A5D44C90-C8CC-4C56-B966-8D30A9AF79A7 wds:Q78155799-B909F145-DF0F-4371-AFDE-6397DA5C0DFD

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