About: Nondestructive characterization of a TiN metal gate: Chemical and structural properties by means of standing-wave hard x-ray photoemission spectroscopy

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About: Nondestructive characterization of a TiN metal gate: Chemical and structural properties by means of standing-wave hard x-ray photoemission spectroscopy Goto Sponge Distinct Permalink

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rdf:type	Item
description	wetenschappelijk artikel (nl) наукова стаття, опублікована в грудні 2012 (uk) im Dezember 2012 veröffentlichter wissenschaftlicher Artikel (de)
publication date	wds:Q62642587-85AD2E7F-5969-49FD-AAE5-7AF3FEB221FB
publication date	2012-12-01 00:00:00Z (xsd:dateTime)
author name string	wds:Q62642587-2C148215-59CE-4207-B64B-F7D43D73F283 wds:Q62642587-30F5085B-1967-4A15-A98F-652242FF8A29 wds:Q62642587-4F16E45F-90F0-4270-AD3A-44A3036C19D4 wds:Q62642587-551CFAF3-6298-4EBE-896D-EA36E505DD78 wds:Q62642587-93E6827C-107C-43B8-9C2A-4379EA4A7001 wds:Q62642587-9F1330B3-1AEB-4384-99B5-FC6F01ED8F8B wds:Q62642587-F249E4DD-F82A-4C60-A16C-74BDA016638F
author name string	H. Yoshikawa K. Kobayashi G. Conti Y. Yamashita S. Ueda C. S. Fadley Y. S. Uritsky
rdfs:label	Nondestructive characterization of a TiN metal gate: Chemical and structural properties by means of standing-wave hard x-ray photoemission spectroscopy (en) Nondestructive characterization of a TiN metal gate: Chemical and structural properties by means of standing-wave hard x-ray photoemission spectroscopy (nl)
skos:prefLabel	Nondestructive characterization of a TiN metal gate: Chemical and structural properties by means of standing-wave hard x-ray photoemission spectroscopy (en) Nondestructive characterization of a TiN metal gate: Chemical and structural properties by means of standing-wave hard x-ray photoemission spectroscopy (nl)
name	Nondestructive characterization of a TiN metal gate: Chemical and structural properties by means of standing-wave hard x-ray photoemission spectroscopy (en) Nondestructive characterization of a TiN metal gate: Chemical and structural properties by means of standing-wave hard x-ray photoemission spectroscopy (nl)
author	wds:Q62642587-202FBC49-4F4E-41EC-AD73-C9484449C720 wds:Q62642587-2C90242E-9ABD-4295-9954-27F219E011A3
author	Christian Papp Benjamin Balke
title	wds:Q62642587-232CAF64-F570-49D5-A67B-957546EE7926
title	Nondestructive characterization of a TiN metal gate: Chemical and structural properties by means of standing-wave hard x-ray photoemission spectroscopy (en)
page(s)	wds:Q62642587-FD2FC07A-69F3-4D1A-9E86-9E0FB1952F25
page(s)	114501
instance of	wds:Q62642587-8726EAC5-35CB-4605-BF22-5586D677D9A5
instance of	scholarly article
published in	wds:Q62642587-22D4D92E-AA0E-4461-857B-A3499CE2652B
published in	Journal of Applied Physics
issue	wds:Q62642587-1C4F800F-2E55-4BCC-AD61-85EE65633012
volume	wds:Q62642587-3CA06DCC-7855-4AE3-B05C-4C0CB6FA45FB
issue	11
volume	112
DOI	wds:Q62642587-121465C2-F0BE-420F-B830-8C1D40F5BAD8
DOI	http://dx.doi.org/10.1063/1.4765720
DOI	10.1063/1.4765720
is owl:sameAs of	Nondestructive characterization of a TiN metal gate: Chemical and structural properties by means of standing-wave hard x-ray photoemission spectroscopy
is about of	https://www.wikidata.org/wiki/Special:EntityData/Q62642587
is cites work of	Concentration and chemical-state profiles at heterogeneous interfaces with sub-nm accuracy from standing-wave ambient-pressure photoemission.
is cites work of	wds:Q46611254-1C765C0E-138D-4DD3-95E8-2C6D7EA8597A

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